Application of pulsed chemical vapor deposition on the SiO2-coated TiO2 production within a rotary reactor at room temperature

Publication date: Available online 3 June 2021Source: Chinese Journal of Chemical EngineeringAuthor(s): Ke Yang, Shan Zhong, Hairong Yue, Siyang Tang, Kui Ma, Changjun Liu, Kai Qiao, Bin Liang

Source: Chinese Journal of Chemical Engineering - June 3, 2021 Category: Chemistry Source Type: research