Effect of oxygen annealing temperature on properties of spatial atomic layer deposited aluminum-doped zinc oxide films

Publication date: October 2021Source: Materials Science in Semiconductor Processing, Volume 133Author(s): Chia-Hsun Hsu, Xin-Peng Geng, Wan-Yu Wu, Ming-Jie Zhao, Pao-Hsun Huang, Xiao-Ying Zhang, Zhan-Bo Su, Zi-Rong Chen, Shui-Yang Lien
Source: Materials Science in Semiconductor Processing - Category: Materials Science Source Type: research