Annealing temperature induced physical characteristics of CuO films grown by magnetron sputtering

Publication date: 15 August 2021Source: Materials Science in Semiconductor Processing, Volume 131Author(s): Wenbo Peng, Yijian Zhou, Jingjie Li, Yue Liu, Jiahui Zhang, Guojiao Xiang, Xuefeng Zhu, Rong Li, Hui Wang, Yang Zhao
Source: Materials Science in Semiconductor Processing - Category: Materials Science Source Type: research