Study on silicon removal property and surface smoothing phenomenon by moderate-pressure microwave hydrogen plasma

Publication date: July 2021Source: Materials Science in Semiconductor Processing, Volume 129Author(s): Hiromasa Ohmi, Kenta Kimoto, Toshimitsu Nomura, Hiroaki Kakiuchi, Kiyoshi Yasutake
Source: Materials Science in Semiconductor Processing - Category: Materials Science Source Type: research