Formation of RuO2 thin film using dopamine as a reducing, chelating, and adhesive agent simultaneously

Publication date: Available online 16 February 2021Source: Journal of the Taiwan Institute of Chemical EngineersAuthor(s): Shih-Cheng Chou, Chun Lin, Bo-Yao Sun, Kuang-Chih Tso, Ting-Shan Chan, Pu-Wei Wu

Source: Journal of the Taiwan Institute of Chemical Engineers - February 16, 2021 Category: Chemistry Source Type: research