Electron beam-induced crystallization of Al2O3 gate layer on β-Ga2O3 MOS capacitors

Publication date: Available online 21 October 2020Source: MicronAuthor(s): Christopher J. Klingshirn, Asanka Jayawardena, Sarit Dhar, Rahul P. Ramamurthy, Dallas Morisette, Zoey Warecki, John Cumings, Tsvetanka Zheleva, Aivars Lelis, Lourdes G. Salamanca-Riba

Source: Micron - October 22, 2020 Category: Biology Source Type: research