An ultra heat-resistant polyimide formulated with photo-base generator for alkaline-developable, negative-type photoresist

Publication date: Available online 16 October 2020Source: Reactive and Functional PolymersAuthor(s): Ling-Ya Tseng, Yan-Cheng Lin, Chih-Cheng Kuo, Chi-Ching Kuo, Mitsuru Ueda, Wen-Chang Chen

Source: Reactive and Functional Polymers - October 18, 2020 Category: Chemistry Source Type: research