Impurity engineering of Czochralski silicon

This article is to present an overview of the current status of impurity engineering in CZ silicon, based on the co-doping technologies of N, Ge and C. The fundamental properties of these three co-dopants and their interaction with point defects in CZ silicon are firstly introduced. The bulk of the article is focused on the effects of co-dopants on the formation of oxygen precipitates related to internal gettering (IG) of devices for metal contaminants, and voids associated with the gate oxide integrity (GOI) of devices in CZ silicon. Finally, the improvement of CZ silicon mechanical strength by co-doping technology is described.
Source: Materials Science and Engineering: R: Reports - Category: Materials Science Source Type: research