Emerging processes for metallurgical coatings and thin films

Publication date: Available online 6 November 2018Source: Comptes Rendus PhysiqueAuthor(s): Alain Billard, Francis Maury, Pascal Aubry, Fanny Balbaud-Célérier, Benjamin Bernard, Fernando Lomello, Hicham Maskrot, Erick Meillot, Alexandre Michau, Frédéric SchusterAbstractInnovation in thin-film deposition processes, thermal spraying and cladding technologies mostly rely on evolutions of their previous iteration. Along with other examples, five case studies of emerging elaboration processes for metallurgical coatings are described coupled with their applications. In the frame of the lifetime extension of components exposed to aggressive media or their functionalization, this article depicts all the developments of the detailed processes. Physical vapor deposition (PVD) of coatings with exceptional properties is possible thanks to sources generating highly ionized metallic vapors. The control of the average energy per incident species and particularly metallic ions strongly influences the characteristics of the deposited layer obtained, for example, with HiPIMS (High Power Impulse Magnetron Sputtering). While PVD techniques are mainly directive regarding the growth of the coating, chemical vapor deposition (CVD) processes manage to homogeneously coat complex 3D shapes. The use of specific precursors in DLI–MOCVD (Direct Liquid Injection – MetalOrganic CVD), carefully selected from the whole metalorganic chemistry, allows one to efficiently treat heat-sensitive substrates ...
Source: Comptes Rendus Physique - Category: Physics Source Type: research