A new method for simultaneous measurement of Seebeck coefficient and resistivity

A new method has been proposed and verified tomeasure the Seebeck coefficient andelectrical resistivity of a sample in the paper. Different from the conventional method for Seebeck coefficient andresistivitymeasurement, the new method adopts a four-point configuration tomeasure both the Seebeck coefficient andresistivity. It can well identify the inhomogeneity of the sample by simply comparing the four Seebeck coefficients of different probe combinations, and it is more accurate and appropriate to take the average value of the four Seebeck coefficients as themeasured result of the Seebeck coefficient of the sample than thatmeasured by the two-point method. Furthermore, the four-point configuration makes it also very convenient tomeasure theresistivity by using the Van der Pauw method. The validity of this method has been verified with both the constantan alloy and p-type Bi2Te3semiconductor samples, and themeasurement results are in good agreement with those obtained by commercial available equipment.

Source: Review of Scientific Instruments - December 6, 2016 Category: Physics Authors: Xu He, Junyou Yang, Qinghui Jiang, Yubo Luo, Dan Zhang, Zhiwei Zhou, Yangyang Ren, Xin Li, Jiwu Xin and Jingdi Hou Source Type: research