Lithographic resolution enhancement of a maskless lithography system based on a wobulation technique for flow lithography

We present a method for improving the lithographic resolution of digital micromirror devices for flow-lithography using a wobulation technique. While maintaining the area ofUV exposure, the lithographic resolution was improved using a wobulation technique, which is a large screen display technique that enhances resolution via overlapping pixels by half a pixel. The edges of a diagonalpattern in amicrostructure were smoothlygenerated with additional sub-patterns compared to conventional singlepattern-exposure. In addition, thesurface roughness of themicrostructure was improved because the gaps between pixels were filled by the overlappingpatterns.

Source: Applied Physics Letters - December 6, 2016 Category: Physics Authors: Kibeom Kim, Sangkwon Han, Jinsik Yoon, Sunghoon Kwon, Hun-Kuk Park and Wook Park Source Type: research